Position detection device and vapor deposition apparatus capable of improving the detection accuracy of the position of a substrate

The present invention provides a position detection device and a vapor deposition apparatus capable of improving the detection accuracy of the position of a substrate. The position detection device 10 includes: an imaging unit 11 for capturing a first image, which is formed by the light reflected fr...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	BANNAI, YUYA, YANAGIHORI, FUMITSUGU, YOSHIDA, YUICHI, OGAWA, KEI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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