Method for manufacturing transfer film comprising seed layer, method for manufacturing circuit board using selective etching of conductive layer and etchant composition

The present invention relates to a method for manufacturing a transfer film including an electrode layer, the method comprising: an electrode layer formation step of forming an electrode layer on a carrier member by using a conductive material; a placement step of placing the carrier member on at le...

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Bibliographische Detailangaben
Hauptverfasser: MOON, BYUNG-WOONG, KIM, JAE-RIN, KIM, SU-HAN, CHUNG, KWANGOON
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The present invention relates to a method for manufacturing a transfer film including an electrode layer, the method comprising: an electrode layer formation step of forming an electrode layer on a carrier member by using a conductive material; a placement step of placing the carrier member on at least one side of an insulating resin layer respectively; a bonding step of bonding the carrier member and the insulating resin layer together by applying pressure thereto; and a transfer step of removing the carrier member to transfer the electrode layer on the insulating resin layer.