Semiconductor device, semiconductor device manufacturing method and overlay error measurement method for semiconductor device

An overlay-error-measurement method for a semiconductor device is provided. The method includes performing a diffraction-based-overlay-error measurement on a first test target of a substrate to respectively obtain first and second diffraction intensity differences corresponding to first and second s...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LIN, HSININ, CHANG, CHI-KANG, FU, SHIHI, TSENG, YUN-HENG, WANG, YUING, CHEN, KAI-HSIUNG, CHU, JIA-HONG, CHENG, POUNG, SU, HSIANG-YU, CHEN, LONG-YI, CHEN, KUEI-SHUN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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