Quantum dot-containing compositions having superior resistance to degradation from exposure to environmental contaminants while maintaining their light generating capabilities

Quantum dot-containing compositions having superior resistance to degradation from exposure to environmental contaminants while maintaining their light generating capabilities

Quantum dot-containing composition, films of quantum dot-containing compositions and assemblies fabricated therewith, all of which having superior resistance to degradation from environmental contaminates, such as air and/or moisture, are provided.

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Bibliographische Detailangaben
Hauptverfasser: SUEN, CHYI-SHAN, CHAO, LIRONG
Format: Patent
Sprache:chi ; eng
Schlagworte:
ADHESIVES
CHEMISTRY
DYES
MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
PAINTS
POLISHES
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Beschreibung
Zusammenfassung:Quantum dot-containing composition, films of quantum dot-containing compositions and assemblies fabricated therewith, all of which having superior resistance to degradation from environmental contaminates, such as air and/or moisture, are provided.