Substrate holder arrangement with mask support

The invention relates to a device for depositing a layer, which has been structured by the application of a mask (4), on a substrate (13), comprising an adjusting device (100, 200) for adjusting the position of a mask support (6) with respect to a support frame (7), a mask lifting device, by which the support frame (7) can be brought together with the mask support (6), the adjusting device (100, 200) and a mask assembly (3), which is carried by a mask support (6) and comprises the mask (4), in the vertical direction from a mask changing position into a processing position, and comprising a substrate holder lifting device, by which the substrate holder (10) can be brought from a loading position in the vertical direction into a processing position. Restraining means (20, 21) restrain the substrate holder (10) in the processing position on the support frame (7), wherein the restraining means have a V groove (21) and a spherical surface (20). The spherical surface (20) is formed by a ball element of the support