Method for determining a distance between a first structure element on a substrate and a second structure element

Provision is made of a method for determining a distance between a first structure element on a substrate and a second structure element, comprising the following steps: - providing a first series of first images, wherein each of the first images comprises at least the first structure element, - pro...

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Bibliographische Detailangaben
1. Verfasser:	BLUMRICH, JOERG FREDERIK
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CALCULATING CINEMATOGRAPHY COMPUTING COUNTING ELECTROGRAPHY HOLOGRAPHY IMAGE DATA PROCESSING OR GENERATION, IN GENERAL MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Provision is made of a method for determining a distance between a first structure element on a substrate and a second structure element, comprising the following steps: - providing a first series of first images, wherein each of the first images comprises at least the first structure element, - providing a second series of second images, wherein each of the second images comprises at least the second structure element, - for each image of the first and second series: determining a respective correlation function from a respective first image of the first series and a respective second image of the second series, - determining an ensemble correlation function from the correlation functions, - determining the distance from the ensemble correlation function. Furthermore, a microscope for carrying out the method is provided.