Method for forming cured film, radiation-sensitive resin composition, and display element and sensor provided with cured film

The invention, which was devised in order to solve the problem, is a method for forming a cured film, said method comprising: a step for forming, on a substrate, a layer that includes a liquid-repellent surface and a layer that includes a liquid-attracting surface; a step for coating the layer inclu...

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Bibliographische Detailangaben
Hauptverfasser:	HAMAGUCHI, HITOSHI, TANAKA, KENROU, WADA, MITSUHIRO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	The invention, which was devised in order to solve the problem, is a method for forming a cured film, said method comprising: a step for forming, on a substrate, a layer that includes a liquid-repellent surface and a layer that includes a liquid-attracting surface; a step for coating the layer including the liquid-attracting surface with a curable composition; a step for curing the coated film; and a step for removing the layer that includes the liquid-repellent surface. The present invention is achieved by using a radiation-sensitive composition that includes a polymer having an acid-dissociable group and a radiation-sensitive acid generator in the formation of the layer that includes the liquid-repelling surface and the layer that includes the liquid-attracting surface.