Ultrapure water manufacturing device

Provided is an ultrapure water manufacturing device that can reduce the heat source cost of a heat exchanger, said heat exchanger being for heating ultrapure water to produce warm ultrapure water. Secondary pure water from a subsystem 4 is heated with a heat exchanger 6 and a heat exchanger 10, and...

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1. Verfasser: HORII, SHIGEKI
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:Provided is an ultrapure water manufacturing device that can reduce the heat source cost of a heat exchanger, said heat exchanger being for heating ultrapure water to produce warm ultrapure water. Secondary pure water from a subsystem 4 is heated with a heat exchanger 6 and a heat exchanger 10, and is sent to a use point. A heat source of the heat exchanger 6 is returning warm ultrapure water from the use point. A heat source fluid of the heat exchanger 10 is warm water that has been heated with a heat pump 20 and a vapor-type heat exchanger 15. Heat sources of the heat pump 20 are warm discharge water from the use point and a retentate of a UF membrane separation device 11A.