Photosensitive resin composition, photosensitive resin layer using same and color filter
A photosensitive resin composition including (A) a quantum dot; (B) a binder resin including a structural unit represented by Chemical Formula 1; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent, photosensitive resin layer manufactured using the same, and a co...
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| creator | CHUNG, MIN-KYEOL SON, BYEONG-GEUN KANG, YONG-HEE HYUNG, KYUNG-HEE PARK, ON-YOU KIM, JONG-GI JEONG, JI-YOUNG LEE, BUM-JIN RYU, YOUN-JE JANG, YOUNG-WOONG KIM, MI-SUN YIM, JI-HYEON PAEK, HO-JEONG YOUN, JIN-SUOP HAN, HYUN-JOO |
| description | A photosensitive resin composition including (A) a quantum dot; (B) a binder resin including a structural unit represented by Chemical Formula 1; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent, photosensitive resin layer manufactured using the same, and a color filter including the photosensitive resin layer. [Chemical Formula 1] (In Chemical Formula 1, each substituent is the same as defined in the specification.). |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TW201825549A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TW201825549A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TW201825549A3</originalsourceid><addsrcrecordid>eNrjZIgIyMgvyS9OzSvOLMksS1UoSi3OzFNIzs8tyAeJ5OfpKBRgU5GTWJlapFAKZKYrFCfmpiok5qUAteXkFymkZeaUpBbxMLCmJeYUp_JCaW4GRTfXEGcP3dSC_PjU4oLE5NS81JL4kHAjA0MLI1NTE0tHY2LUAABG0juG</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Photosensitive resin composition, photosensitive resin layer using same and color filter</title><source>esp@cenet</source><creator>CHUNG, MIN-KYEOL ; SON, BYEONG-GEUN ; KANG, YONG-HEE ; HYUNG, KYUNG-HEE ; PARK, ON-YOU ; KIM, JONG-GI ; JEONG, JI-YOUNG ; LEE, BUM-JIN ; RYU, YOUN-JE ; JANG, YOUNG-WOONG ; KIM, MI-SUN ; YIM, JI-HYEON ; PAEK, HO-JEONG ; YOUN, JIN-SUOP ; HAN, HYUN-JOO</creator><creatorcontrib>CHUNG, MIN-KYEOL ; SON, BYEONG-GEUN ; KANG, YONG-HEE ; HYUNG, KYUNG-HEE ; PARK, ON-YOU ; KIM, JONG-GI ; JEONG, JI-YOUNG ; LEE, BUM-JIN ; RYU, YOUN-JE ; JANG, YOUNG-WOONG ; KIM, MI-SUN ; YIM, JI-HYEON ; PAEK, HO-JEONG ; YOUN, JIN-SUOP ; HAN, HYUN-JOO</creatorcontrib><description>A photosensitive resin composition including (A) a quantum dot; (B) a binder resin including a structural unit represented by Chemical Formula 1; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent, photosensitive resin layer manufactured using the same, and a color filter including the photosensitive resin layer. [Chemical Formula 1] (In Chemical Formula 1, each substituent is the same as defined in the specification.).</description><language>chi ; eng</language><subject>ADHESIVES ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMISTRY ; CINEMATOGRAPHY ; COMPOSITIONS BASED THEREON ; DYES ; ELECTROGRAPHY ; HOLOGRAPHY ; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; MATERIALS THEREFOR ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORGANIC MACROMOLECULAR COMPOUNDS ; ORIGINALS THEREFOR ; PAINTS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; POLISHES ; THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180716&DB=EPODOC&CC=TW&NR=201825549A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25544,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180716&DB=EPODOC&CC=TW&NR=201825549A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CHUNG, MIN-KYEOL</creatorcontrib><creatorcontrib>SON, BYEONG-GEUN</creatorcontrib><creatorcontrib>KANG, YONG-HEE</creatorcontrib><creatorcontrib>HYUNG, KYUNG-HEE</creatorcontrib><creatorcontrib>PARK, ON-YOU</creatorcontrib><creatorcontrib>KIM, JONG-GI</creatorcontrib><creatorcontrib>JEONG, JI-YOUNG</creatorcontrib><creatorcontrib>LEE, BUM-JIN</creatorcontrib><creatorcontrib>RYU, YOUN-JE</creatorcontrib><creatorcontrib>JANG, YOUNG-WOONG</creatorcontrib><creatorcontrib>KIM, MI-SUN</creatorcontrib><creatorcontrib>YIM, JI-HYEON</creatorcontrib><creatorcontrib>PAEK, HO-JEONG</creatorcontrib><creatorcontrib>YOUN, JIN-SUOP</creatorcontrib><creatorcontrib>HAN, HYUN-JOO</creatorcontrib><title>Photosensitive resin composition, photosensitive resin layer using same and color filter</title><description>A photosensitive resin composition including (A) a quantum dot; (B) a binder resin including a structural unit represented by Chemical Formula 1; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent, photosensitive resin layer manufactured using the same, and a color filter including the photosensitive resin layer. [Chemical Formula 1] (In Chemical Formula 1, each substituent is the same as defined in the specification.).</description><subject>ADHESIVES</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>DYES</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>ORIGINALS THEREFOR</subject><subject>PAINTS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>POLISHES</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZIgIyMgvyS9OzSvOLMksS1UoSi3OzFNIzs8tyAeJ5OfpKBRgU5GTWJlapFAKZKYrFCfmpiok5qUAteXkFymkZeaUpBbxMLCmJeYUp_JCaW4GRTfXEGcP3dSC_PjU4oLE5NS81JL4kHAjA0MLI1NTE0tHY2LUAABG0juG</recordid><startdate>20180716</startdate><enddate>20180716</enddate><creator>CHUNG, MIN-KYEOL</creator><creator>SON, BYEONG-GEUN</creator><creator>KANG, YONG-HEE</creator><creator>HYUNG, KYUNG-HEE</creator><creator>PARK, ON-YOU</creator><creator>KIM, JONG-GI</creator><creator>JEONG, JI-YOUNG</creator><creator>LEE, BUM-JIN</creator><creator>RYU, YOUN-JE</creator><creator>JANG, YOUNG-WOONG</creator><creator>KIM, MI-SUN</creator><creator>YIM, JI-HYEON</creator><creator>PAEK, HO-JEONG</creator><creator>YOUN, JIN-SUOP</creator><creator>HAN, HYUN-JOO</creator><scope>EVB</scope></search><sort><creationdate>20180716</creationdate><title>Photosensitive resin composition, photosensitive resin layer using same and color filter</title><author>CHUNG, MIN-KYEOL ; SON, BYEONG-GEUN ; KANG, YONG-HEE ; HYUNG, KYUNG-HEE ; PARK, ON-YOU ; KIM, JONG-GI ; JEONG, JI-YOUNG ; LEE, BUM-JIN ; RYU, YOUN-JE ; JANG, YOUNG-WOONG ; KIM, MI-SUN ; YIM, JI-HYEON ; PAEK, HO-JEONG ; YOUN, JIN-SUOP ; HAN, HYUN-JOO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TW201825549A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2018</creationdate><topic>ADHESIVES</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>DYES</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>ORIGINALS THEREFOR</topic><topic>PAINTS</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>POLISHES</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>CHUNG, MIN-KYEOL</creatorcontrib><creatorcontrib>SON, BYEONG-GEUN</creatorcontrib><creatorcontrib>KANG, YONG-HEE</creatorcontrib><creatorcontrib>HYUNG, KYUNG-HEE</creatorcontrib><creatorcontrib>PARK, ON-YOU</creatorcontrib><creatorcontrib>KIM, JONG-GI</creatorcontrib><creatorcontrib>JEONG, JI-YOUNG</creatorcontrib><creatorcontrib>LEE, BUM-JIN</creatorcontrib><creatorcontrib>RYU, YOUN-JE</creatorcontrib><creatorcontrib>JANG, YOUNG-WOONG</creatorcontrib><creatorcontrib>KIM, MI-SUN</creatorcontrib><creatorcontrib>YIM, JI-HYEON</creatorcontrib><creatorcontrib>PAEK, HO-JEONG</creatorcontrib><creatorcontrib>YOUN, JIN-SUOP</creatorcontrib><creatorcontrib>HAN, HYUN-JOO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CHUNG, MIN-KYEOL</au><au>SON, BYEONG-GEUN</au><au>KANG, YONG-HEE</au><au>HYUNG, KYUNG-HEE</au><au>PARK, ON-YOU</au><au>KIM, JONG-GI</au><au>JEONG, JI-YOUNG</au><au>LEE, BUM-JIN</au><au>RYU, YOUN-JE</au><au>JANG, YOUNG-WOONG</au><au>KIM, MI-SUN</au><au>YIM, JI-HYEON</au><au>PAEK, HO-JEONG</au><au>YOUN, JIN-SUOP</au><au>HAN, HYUN-JOO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Photosensitive resin composition, photosensitive resin layer using same and color filter</title><date>2018-07-16</date><risdate>2018</risdate><abstract>A photosensitive resin composition including (A) a quantum dot; (B) a binder resin including a structural unit represented by Chemical Formula 1; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent, photosensitive resin layer manufactured using the same, and a color filter including the photosensitive resin layer. [Chemical Formula 1] (In Chemical Formula 1, each substituent is the same as defined in the specification.).</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ADHESIVES APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON DYES ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE MATERIALS THEREFOR METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PAINTS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS POLISHES THEIR PREPARATION OR CHEMICAL WORKING-UP |
| title | Photosensitive resin composition, photosensitive resin layer using same and color filter |
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