Photosensitive resin composition, photosensitive resin layer using same and color filter

Photosensitive resin composition, photosensitive resin layer using same and color filter

A photosensitive resin composition including (A) a quantum dot; (B) a binder resin including a structural unit represented by Chemical Formula 1; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent, photosensitive resin layer manufactured using the same, and a co...

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Bibliographische Detailangaben
Hauptverfasser: CHUNG, MIN-KYEOL, SON, BYEONG-GEUN, KANG, YONG-HEE, HYUNG, KYUNG-HEE, PARK, ON-YOU, KIM, JONG-GI, JEONG, JI-YOUNG, LEE, BUM-JIN, RYU, YOUN-JE, JANG, YOUNG-WOONG, KIM, MI-SUN, YIM, JI-HYEON, PAEK, HO-JEONG, YOUN, JIN-SUOP, HAN, HYUN-JOO
Format: Patent
Sprache:chi ; eng
Schlagworte:
ADHESIVES
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
DYES
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE
MATERIALS THEREFOR
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PAINTS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
POLISHES
THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:A photosensitive resin composition including (A) a quantum dot; (B) a binder resin including a structural unit represented by Chemical Formula 1; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent, photosensitive resin layer manufactured using the same, and a color filter including the photosensitive resin layer. [Chemical Formula 1] (In Chemical Formula 1, each substituent is the same as defined in the specification.).