Single filter with multiple attenuation applied for exposure machine and its spectrum adjustment method

An exposure machine having single filter with multiple attenuation comprises a device host, an illuminating component and a filter component. The device host has a containing space. The illuminating component may be positioned inside or outside the containing space and produces a first light beam having a pre-determined spectrum, which has a plurality of frequency spectrums. The filter component may be positioned inside or outside the containing space and is placed on an opposite side of the illuminating component facing the device host, and having an attenuation structure for the energy of different wavelengths. Wherein, when the first light beam passes through the filter component, the filter component absorbs or controls at least one of the frequency spectrums via the attenuation structure, so as to make the first light beam which passes through the filter component transforms into a second light beam having a particular spectrum.