Metal mask for vapor deposition, production method for metal mask for vapor deposition, and production method for display device

A vapor deposition metal mask is provided with mask regions that comprise multiple mask holes. The connecting part of each mask hole that is located outside of the center of the mask region has a shape that protrudes toward the inside of the mask hole over the entire circumference of the mask hole,...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	NISHI, TAKEHIRO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A vapor deposition metal mask is provided with mask regions that comprise multiple mask holes. The connecting part of each mask hole that is located outside of the center of the mask region has a shape that protrudes toward the inside of the mask hole over the entire circumference of the mask hole, and is configured from a first portion, which is the portion toward the center of the mask region, and a second portion, which is the portion toward the edge of the mask region. The distance between the first portion and the back surface of the mask region is a first step high, and the first step high in the edge region is smaller than the first step high in the center region.