Composition for hard mask

The present invention relates to a composition for a hard mask, and more specifically, to a resist underlayer film (hard mask) excellent in heat resistance and flatness can be formed by comprising a copolymer having a repeating unit represented by a specific chemical formula and a solvent.

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Bibliographische Detailangaben
Hauptverfasser:	YANG, DON-SIK, CHOI, HAN-YOUNG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	The present invention relates to a composition for a hard mask, and more specifically, to a resist underlayer film (hard mask) excellent in heat resistance and flatness can be formed by comprising a copolymer having a repeating unit represented by a specific chemical formula and a solvent.