Plasma processing apparatus

The present invention provides a plasma processing apparatus capable of shortening the return current path and ensuring the symmetry thereof. One aspect of the plasma processing apparatus of the present invention includes a chamber body, a carrier, a high frequency electrode, a plurality of grounding members, and a movable unit. The chamber body has side walls of which a part of one side wall has an opening section through which the substrate can pass. The plurality of grounding members are disposed on a periphery of the carrier and electrically connect the side walls with the carrier. The movable unit has a supporting body supporting the first grounding member that is served as a part of the plurality of grounding members. The movable unit enables the supporting body to be movable between a first position and a second position. The first position is the position where the first grounding member faces an inner circumferential face of the opening section, and the second position is the position where the first