Load lock chamber and the cluster tool system using the same
Disclosed is a load lock chamber which includes a chamber body including: at least one pair of chambers configured to load one or more wafer substrate; and at least one interior line disposed between the paired chambers and communicated with the paired chambers so as to supply gas into or exhaust ga...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | Disclosed is a load lock chamber which includes a chamber body including: at least one pair of chambers configured to load one or more wafer substrate; and at least one interior line disposed between the paired chambers and communicated with the paired chambers so as to supply gas into or exhaust gas from the pair of chambers. Said load lock chamber is provided with a plurality of layer structures, and each of the layer structures contains the pair of chambers. Said chamber body includes a frame having interior walls defining the pair of chambers. Said chamber body further includes lids detachably mounted on the frame, and the pair of chambers is defined when the lids and the interior walls of the frame are engaged. |
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