Deposition method of passivation film for light emitting diode
This invention is related with a method of depositing a passivation layer of a light emitting device, the method comprising: a step of depositing a first inorganic protective film on a light emitting element of the substrate; and a step of depositing a second inorganic protective film having an inte...
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| Format: | Patent |
| Sprache: | chi ; eng |
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| Zusammenfassung: | This invention is related with a method of depositing a passivation layer of a light emitting device, the method comprising: a step of depositing a first inorganic protective film on a light emitting element of the substrate; and a step of depositing a second inorganic protective film having an internal stress relatively lower than that of the first inorganic protective film on the first inorganic protective film. |
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