Polishing apparatus

The present invention relates to a polishing apparatus wherein a polishing body is supported by a head with an interposed elastic instrument to avoid an overshoot on a target load during polishing which occurs when a location control is turned into a load control. According to the present invention,...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: OMAGARI, HIROAKI, MUROFUSHI, YU, TOMIYASU, MASATERU
Format: Patent
Sprache:chi ; eng
Schlagworte:
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