Photosensitive resin composition for biochip and method for forming liquid-repellent film

The following, inter alia, are provided: a photosensitive resin composition for biochips that, even without the execution of a PEB treatment, is capable of forming a liquid-repellent film at high resolution using an aqueous alkali solution; a method of formation; and a method for producing biochips....

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Bibliographische Detailangaben
Hauptverfasser: SASAKI, MIYAKO, SAKURADA, TOMOAKI, TANIGUCHI, TAIHEI, OBI, MASAKI
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The following, inter alia, are provided: a photosensitive resin composition for biochips that, even without the execution of a PEB treatment, is capable of forming a liquid-repellent film at high resolution using an aqueous alkali solution; a method of formation; and a method for producing biochips. The photosensitive resin composition for biochips comprises the following polymer (A) or comprises the following polymer (B) and the following polymer (C) and characteristically contains 35-97 mol% of the following unit (u2) with reference to the total number of units constituting the composition. Unit (u2): unit represented by formula (II). Polymer (A): polymer having a unit (u2) and a unit (u1) having an organic group that has at least one fluorine atom. Polymer (B): polymer other than polymer (A) and having a unit (u1) having an organic group that has at least one fluorine atom. Polymer (C): polymer other than polymer (A) and having a unit (u2). (R21: hydrogen atom or methyl group; R22: alkyl group or the like;