Etching device and etching method

The present invention provides an etching device and an etching method. The etching device comprises an etching chamber (1; 1a) and a chuck (CH) located therein for mounting a substrate (S) to be etched, a plasma generating device (C) surrounding the etching chamber (1; 1a) in a region (1a) and a ga...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	BREITSCHAEDEL, OLIVER, KAELBERER, ARND, ZIELKE, CHRISTIAN, ARTMANN, HANS, STAFFELD, PETER BORWIN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
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