Apparatus for holding substrate

An apparatus for holding a substrate has a chuck cup, a seal shell, a chuck plate and a vertical driving device. The seal shell has a bottom wall, an outer wall and an inner wall. The inner wall forms a lip seal portion. The bottom wall and the outer wall of the seal shell respectively wrap the bott...

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Bibliographische Detailangaben
Hauptverfasser:	JIA, ZHAO-WEI, WANG, HUI, YANG, HONGAO, WANG, JIAN, WU, JUN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS THEREFOR CHEMISTRY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES METALLURGY PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS
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Beschreibung
Zusammenfassung:	An apparatus for holding a substrate has a chuck cup, a seal shell, a chuck plate and a vertical driving device. The seal shell has a bottom wall, an outer wall and an inner wall. The inner wall forms a lip seal portion. The bottom wall and the outer wall of the seal shell respectively wrap the bottom surface and the outer surface of the base portion of the chuck cup. The lip seal portion wraps the supporting portion of the chuck cup for sealing the edge of the front side of the substrate. The apparatus protects the edge of the front side of the substrate, the back side of the substrate and the chuck cup from contacting with the electrolyte solution.