Photoresist stripper

To provide a photoresist stripper having high stripping properties and having excellent anti-corrosiveness against a plurality of metals (particularly copper or copper alloy, and tin or tin alloy). This invention relates to a stripper comprising dimethyl sulfoxide, quaternary ammonium hydroxide, mal...

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Bibliographische Detailangaben
1. Verfasser:	NISHIJIMA, YOSHITAKA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	To provide a photoresist stripper having high stripping properties and having excellent anti-corrosiveness against a plurality of metals (particularly copper or copper alloy, and tin or tin alloy). This invention relates to a stripper comprising dimethyl sulfoxide, quaternary ammonium hydroxide, maltol and creatinine. Preferably, the stripper comprises alkyleneamine and/or alkanolamine.