A lithography apparatus, a method of manufacturing a device and a control program
A route for a substrate support that supports a substrate in an immersion lithographic apparatus is calculated to satisfy the following constraints: after the edge of the substrate first contacts the immersion space, the substrate remains in contact with the immersion space until all target portions...
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| creator | MATTAAR, THOMAS AUGUSTUS MELMAN, JOHANNES CORNELIS PAULUS PIETERSE, GERBEN VAN DE VEN, JAN-PIET VAN DE VEN, JOHANNES THEODORUS GUILLIELMUS MARIA VAN GILS, PETRUS FRANCISCUS VAN DEN NIEUWELAAR, NORBERTUS JOSEPHUS MARTINUS BLANCO CARBALLO, VICTOR MANUEL |
| description | A route for a substrate support that supports a substrate in an immersion lithographic apparatus is calculated to satisfy the following constraints: after the edge of the substrate first contacts the immersion space, the substrate remains in contact with the immersion space until all target portions are exposed; exposures of target portions are performed whilst the substrate moves in a scan direction; and all movements of the substrate between exposures are, in a plane parallel to its upper surface, either curved or only in one of the scan directions or transverse directions. |
| format | Patent |
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| language | chi ; eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | A lithography apparatus, a method of manufacturing a device and a control program |
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