A lithography apparatus, a method of manufacturing a device and a control program

A route for a substrate support that supports a substrate in an immersion lithographic apparatus is calculated to satisfy the following constraints: after the edge of the substrate first contacts the immersion space, the substrate remains in contact with the immersion space until all target portions...

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Bibliographische Detailangaben
Hauptverfasser:	MATTAAR, THOMAS AUGUSTUS, MELMAN, JOHANNES CORNELIS PAULUS, PIETERSE, GERBEN, VAN DE VEN, JAN-PIET, VAN DE VEN, JOHANNES THEODORUS GUILLIELMUS MARIA, VAN GILS, PETRUS FRANCISCUS, VAN DEN NIEUWELAAR, NORBERTUS JOSEPHUS MARTINUS, BLANCO CARBALLO, VICTOR MANUEL
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A route for a substrate support that supports a substrate in an immersion lithographic apparatus is calculated to satisfy the following constraints: after the edge of the substrate first contacts the immersion space, the substrate remains in contact with the immersion space until all target portions are exposed; exposures of target portions are performed whilst the substrate moves in a scan direction; and all movements of the substrate between exposures are, in a plane parallel to its upper surface, either curved or only in one of the scan directions or transverse directions.