Epitaxial wafer surface inspection device and epitaxial wafer surface inspection method using the same

The invention provides epitaxial wafer surface inspection device capable of sensing whether or not there is an epitaxial scratch on the epitaxial wafer surface. The epitaxial wafer surface inspection device 100 includes: an optical system 30 having a first spot illumination source 21 arranged at an angle [theta]1 ranging from 60 DEG to 80 DEG with respect to the surface of an epitaxial wafer 1, a second spot illumination source 22 arranged at an angle [theta]2 ranging from 60 DEG to 80 DEG with respect to the surface, and a capturing portion 10 arranged in perpendicular to the surface; and a scan portion 40 scanning the optical system 30 in parallel to the surface, wherein on the plane in parallel to the surface, it is assumed that the capturing potion 10 is a center point, and a degree between the first spot illumination source 21 and second spot illumination source 22 ranges from 85 DEG to 95 DEG.