A method for manufacturing a membrane assembly
A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a s...
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creator | VOORTHUIJZEN, WILLEM-PIETER VERBRUGGE, BEATRIJS LOUISE MARIE-JOSEPH KATRIEN VAN DER ZANDE, WILLEM JOAN VERMEULEN, JOHANNES PETRUS MARTINUS BERNARDUS VAN ZWOL, PIETER-JAN DRUZHININA, TAMARA KUIJKEN, MICHAEL ALFRED JOSEPHUS CASIMIRI, ERIC WILLEM FELIX VLES, DAVID FERDINAND HOUWELING, ZOMER SILVESTER PETER, MARIA LEENDERS, MARTINUS HENDRIKUS ANTONIUS JANSSEN, PAUL OOSTERHOFF, SICCO |
description | A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate. |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TW201719272A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TW201719272A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TW201719272A3</originalsourceid><addsrcrecordid>eNrjZNBzVMhNLcnIT1FIyy9SyE3MK01LTC4pLcrMS1dIBErlJhUl5qUqJBYXA5k5lTwMrGmJOcWpvFCam0HRzTXE2UM3tSA_PrW4IDE5NS-1JD4k3MjA0NzQ0sjcyNGYGDUA4mkqjA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>A method for manufacturing a membrane assembly</title><source>esp@cenet</source><creator>VOORTHUIJZEN, WILLEM-PIETER ; VERBRUGGE, BEATRIJS LOUISE MARIE-JOSEPH KATRIEN ; VAN DER ZANDE, WILLEM JOAN ; VERMEULEN, JOHANNES PETRUS MARTINUS BERNARDUS ; VAN ZWOL, PIETER-JAN ; DRUZHININA, TAMARA ; KUIJKEN, MICHAEL ALFRED JOSEPHUS ; CASIMIRI, ERIC WILLEM FELIX ; VLES, DAVID FERDINAND ; HOUWELING, ZOMER SILVESTER ; PETER, MARIA ; LEENDERS, MARTINUS HENDRIKUS ANTONIUS ; JANSSEN, PAUL ; OOSTERHOFF, SICCO</creator><creatorcontrib>VOORTHUIJZEN, WILLEM-PIETER ; VERBRUGGE, BEATRIJS LOUISE MARIE-JOSEPH KATRIEN ; VAN DER ZANDE, WILLEM JOAN ; VERMEULEN, JOHANNES PETRUS MARTINUS BERNARDUS ; VAN ZWOL, PIETER-JAN ; DRUZHININA, TAMARA ; KUIJKEN, MICHAEL ALFRED JOSEPHUS ; CASIMIRI, ERIC WILLEM FELIX ; VLES, DAVID FERDINAND ; HOUWELING, ZOMER SILVESTER ; PETER, MARIA ; LEENDERS, MARTINUS HENDRIKUS ANTONIUS ; JANSSEN, PAUL ; OOSTERHOFF, SICCO</creatorcontrib><description>A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170601&DB=EPODOC&CC=TW&NR=201719272A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25569,76552</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170601&DB=EPODOC&CC=TW&NR=201719272A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>VOORTHUIJZEN, WILLEM-PIETER</creatorcontrib><creatorcontrib>VERBRUGGE, BEATRIJS LOUISE MARIE-JOSEPH KATRIEN</creatorcontrib><creatorcontrib>VAN DER ZANDE, WILLEM JOAN</creatorcontrib><creatorcontrib>VERMEULEN, JOHANNES PETRUS MARTINUS BERNARDUS</creatorcontrib><creatorcontrib>VAN ZWOL, PIETER-JAN</creatorcontrib><creatorcontrib>DRUZHININA, TAMARA</creatorcontrib><creatorcontrib>KUIJKEN, MICHAEL ALFRED JOSEPHUS</creatorcontrib><creatorcontrib>CASIMIRI, ERIC WILLEM FELIX</creatorcontrib><creatorcontrib>VLES, DAVID FERDINAND</creatorcontrib><creatorcontrib>HOUWELING, ZOMER SILVESTER</creatorcontrib><creatorcontrib>PETER, MARIA</creatorcontrib><creatorcontrib>LEENDERS, MARTINUS HENDRIKUS ANTONIUS</creatorcontrib><creatorcontrib>JANSSEN, PAUL</creatorcontrib><creatorcontrib>OOSTERHOFF, SICCO</creatorcontrib><title>A method for manufacturing a membrane assembly</title><description>A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNBzVMhNLcnIT1FIyy9SyE3MK01LTC4pLcrMS1dIBErlJhUl5qUqJBYXA5k5lTwMrGmJOcWpvFCam0HRzTXE2UM3tSA_PrW4IDE5NS-1JD4k3MjA0NzQ0sjcyNGYGDUA4mkqjA</recordid><startdate>20170601</startdate><enddate>20170601</enddate><creator>VOORTHUIJZEN, WILLEM-PIETER</creator><creator>VERBRUGGE, BEATRIJS LOUISE MARIE-JOSEPH KATRIEN</creator><creator>VAN DER ZANDE, WILLEM JOAN</creator><creator>VERMEULEN, JOHANNES PETRUS MARTINUS BERNARDUS</creator><creator>VAN ZWOL, PIETER-JAN</creator><creator>DRUZHININA, TAMARA</creator><creator>KUIJKEN, MICHAEL ALFRED JOSEPHUS</creator><creator>CASIMIRI, ERIC WILLEM FELIX</creator><creator>VLES, DAVID FERDINAND</creator><creator>HOUWELING, ZOMER SILVESTER</creator><creator>PETER, MARIA</creator><creator>LEENDERS, MARTINUS HENDRIKUS ANTONIUS</creator><creator>JANSSEN, PAUL</creator><creator>OOSTERHOFF, SICCO</creator><scope>EVB</scope></search><sort><creationdate>20170601</creationdate><title>A method for manufacturing a membrane assembly</title><author>VOORTHUIJZEN, WILLEM-PIETER ; VERBRUGGE, BEATRIJS LOUISE MARIE-JOSEPH KATRIEN ; VAN DER ZANDE, WILLEM JOAN ; VERMEULEN, JOHANNES PETRUS MARTINUS BERNARDUS ; VAN ZWOL, PIETER-JAN ; DRUZHININA, TAMARA ; KUIJKEN, MICHAEL ALFRED JOSEPHUS ; CASIMIRI, ERIC WILLEM FELIX ; VLES, DAVID FERDINAND ; HOUWELING, ZOMER SILVESTER ; PETER, MARIA ; LEENDERS, MARTINUS HENDRIKUS ANTONIUS ; JANSSEN, PAUL ; OOSTERHOFF, SICCO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TW201719272A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2017</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>VOORTHUIJZEN, WILLEM-PIETER</creatorcontrib><creatorcontrib>VERBRUGGE, BEATRIJS LOUISE MARIE-JOSEPH KATRIEN</creatorcontrib><creatorcontrib>VAN DER ZANDE, WILLEM JOAN</creatorcontrib><creatorcontrib>VERMEULEN, JOHANNES PETRUS MARTINUS BERNARDUS</creatorcontrib><creatorcontrib>VAN ZWOL, PIETER-JAN</creatorcontrib><creatorcontrib>DRUZHININA, TAMARA</creatorcontrib><creatorcontrib>KUIJKEN, MICHAEL ALFRED JOSEPHUS</creatorcontrib><creatorcontrib>CASIMIRI, ERIC WILLEM FELIX</creatorcontrib><creatorcontrib>VLES, DAVID FERDINAND</creatorcontrib><creatorcontrib>HOUWELING, ZOMER SILVESTER</creatorcontrib><creatorcontrib>PETER, MARIA</creatorcontrib><creatorcontrib>LEENDERS, MARTINUS HENDRIKUS ANTONIUS</creatorcontrib><creatorcontrib>JANSSEN, PAUL</creatorcontrib><creatorcontrib>OOSTERHOFF, SICCO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>VOORTHUIJZEN, WILLEM-PIETER</au><au>VERBRUGGE, BEATRIJS LOUISE MARIE-JOSEPH KATRIEN</au><au>VAN DER ZANDE, WILLEM JOAN</au><au>VERMEULEN, JOHANNES PETRUS MARTINUS BERNARDUS</au><au>VAN ZWOL, PIETER-JAN</au><au>DRUZHININA, TAMARA</au><au>KUIJKEN, MICHAEL ALFRED JOSEPHUS</au><au>CASIMIRI, ERIC WILLEM FELIX</au><au>VLES, DAVID FERDINAND</au><au>HOUWELING, ZOMER SILVESTER</au><au>PETER, MARIA</au><au>LEENDERS, MARTINUS HENDRIKUS ANTONIUS</au><au>JANSSEN, PAUL</au><au>OOSTERHOFF, SICCO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>A method for manufacturing a membrane assembly</title><date>2017-06-01</date><risdate>2017</risdate><abstract>A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.</abstract><oa>free_for_read</oa></addata></record> |
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language | chi ; eng |
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subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
title | A method for manufacturing a membrane assembly |
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