A method for manufacturing a membrane assembly

A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a s...

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Hauptverfasser:	VOORTHUIJZEN, WILLEM-PIETER, VERBRUGGE, BEATRIJS LOUISE MARIE-JOSEPH KATRIEN, VAN DER ZANDE, WILLEM JOAN, VERMEULEN, JOHANNES PETRUS MARTINUS BERNARDUS, VAN ZWOL, PIETER-JAN, DRUZHININA, TAMARA, KUIJKEN, MICHAEL ALFRED JOSEPHUS, CASIMIRI, ERIC WILLEM FELIX, VLES, DAVID FERDINAND, HOUWELING, ZOMER SILVESTER, PETER, MARIA, LEENDERS, MARTINUS HENDRIKUS ANTONIUS, JANSSEN, PAUL, OOSTERHOFF, SICCO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.