Techniques to prevent film cracking in thermally cured dielectric film, and associated configurations

Embodiments of the present disclosure describe techniques to prevent film cracking in thermally cured dielectric film, and associated configurations. A dielectric film may be formed on a patterned metal layer and a substrate on which the patterned metal layer is disposed. A photo-patterned dielectri...

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Bibliographische Detailangaben
Hauptverfasser: GANESAN, KRISHNA PRAKASH, LYTLE, WAYNE M, SATTIRAJU, SESHU V, KHIRE, VAIBHAV S
Format: Patent
Sprache:chi ; eng
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