Wafer washing method, and liquid chemical used in same

To provide a liquid chemical used for forming a water repellent protective membrane, said liquid chemical being used in a wafer washing method in which a washing device that includes a vinyl chloride resin as a wetted member is used. A liquid chemical is used, said liquid chemical including at least...

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Bibliographische Detailangaben
Hauptverfasser:	OKUMURA, YUZO, TAKATA, TOMOHIRO, IMACHI, MASAYOSHI, ABE, KAZUYUKI, KUMON, SOICHI, SAIO, TAKASHI, FUKAZAWA, HIROKI, FUKUI, YUKI, WATANABE, SHOTA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ADHESIVES BASIC ELECTRIC ELEMENTS CHEMISTRY CLEANING CLEANING IN GENERAL DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PERFORMING OPERATIONS POLISHES PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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Beschreibung
Zusammenfassung:	To provide a liquid chemical used for forming a water repellent protective membrane, said liquid chemical being used in a wafer washing method in which a washing device that includes a vinyl chloride resin as a wetted member is used. A liquid chemical is used, said liquid chemical including at least one compound selected from the group consisting of: an alkoxysilane represented by general formula [1]; a sulfonic acid represented by general formula [2]; an anhydrate of said sulfonic acid; a salt of said sulfonic acid; and a sulfonic acid derivative represented by general formula [3]. Also included in the liquid chemical is a dilution solvent having at least one compound selected from the group consisting of a hydrocarbon, ether, and thiol. [1] (R1) aSi (H)b (OR2)4-a-b [2] R3 - S(=O)2OH [3] R3 - S (=O)2 O-Si (H)3-c (R4)c.