Method of patterning thin film

Method of patterning thin film includes steps as follows. A thin film is formed, a mask covers the thin film, and a solvent annealing and illuminating step is conducted. The thin film includes a first molecule which includes a conjugated structure. The mask includes at least one exposure area. A lig...

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Bibliographische Detailangaben

Hauptverfasser:	ARNOLD YANG, CHANGMOU, CHEN, WEIUN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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