Method of patterning thin film

Method of patterning thin film includes steps as follows. A thin film is formed, a mask covers the thin film, and a solvent annealing and illuminating step is conducted. The thin film includes a first molecule which includes a conjugated structure. The mask includes at least one exposure area. A lig...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: ARNOLD YANG, CHANGMOU, CHEN, WEIUN
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Method of patterning thin film includes steps as follows. A thin film is formed, a mask covers the thin film, and a solvent annealing and illuminating step is conducted. The thin film includes a first molecule which includes a conjugated structure. The mask includes at least one exposure area. A light source is used to illuminate the thin film in the solvent annealing and illuminating step, and the solvent annealing and illuminating step is conducted under atmosphere of a first solvent. The range of the wavelength of the light source is correspondent to the energy allowing the first molecule to reach an excited state. Thus, a thickness of an illuminated area of the thin film is increased or decreased, and a pattern is accordingly formed on the thin film. The method of patterning thin film includes advantages as follows. The process is simplified, the production efficiency is enhanced, and the environment appeal can be satisfied.