Method of patterning thin film
Method of patterning thin film includes steps as follows. A thin film is formed, a mask covers the thin film, and a solvent annealing and illuminating step is conducted. The thin film includes a first molecule which includes a conjugated structure. The mask includes at least one exposure area. A lig...
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| creator | ARNOLD YANG, CHANGMOU CHEN, WEIUN |
| description | Method of patterning thin film includes steps as follows. A thin film is formed, a mask covers the thin film, and a solvent annealing and illuminating step is conducted. The thin film includes a first molecule which includes a conjugated structure. The mask includes at least one exposure area. A light source is used to illuminate the thin film in the solvent annealing and illuminating step, and the solvent annealing and illuminating step is conducted under atmosphere of a first solvent. The range of the wavelength of the light source is correspondent to the energy allowing the first molecule to reach an excited state. Thus, a thickness of an illuminated area of the thin film is increased or decreased, and a pattern is accordingly formed on the thin film. The method of patterning thin film includes advantages as follows. The process is simplified, the production efficiency is enhanced, and the environment appeal can be satisfied. |
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A thin film is formed, a mask covers the thin film, and a solvent annealing and illuminating step is conducted. The thin film includes a first molecule which includes a conjugated structure. The mask includes at least one exposure area. A light source is used to illuminate the thin film in the solvent annealing and illuminating step, and the solvent annealing and illuminating step is conducted under atmosphere of a first solvent. The range of the wavelength of the light source is correspondent to the energy allowing the first molecule to reach an excited state. Thus, a thickness of an illuminated area of the thin film is increased or decreased, and a pattern is accordingly formed on the thin film. The method of patterning thin film includes advantages as follows. The process is simplified, the production efficiency is enhanced, and the environment appeal can be satisfied.</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Method of patterning thin film |
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