Reticle cooling by non-uniform gas flow

An apparatus, system, and method cool a patterning device by supplying a non-uniform gas flow. The apparatus and system include a gas supply structure that supplies a gas flow across the first surface of the patterning device. The gas supply structure includes a gas supply nozzle specially configure...

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Bibliographische Detailangaben
Hauptverfasser:	VOGEL, HERMAN, ONVLEE, JOHANNES, WARD, CHRISTOPHER CHARLES, DELPUERTO, SANTIAGO E, SCHULTZ, GEOFFREY, GALBURT, DANIEL NICHOLAS, VENTURINO, THOMAS, BURBANK, DANIEL NATHAN, VAN BOKHOVEN, LAURENTIUS JOHANNES ADRIANUS
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	An apparatus, system, and method cool a patterning device by supplying a non-uniform gas flow. The apparatus and system include a gas supply structure that supplies a gas flow across the first surface of the patterning device. The gas supply structure includes a gas supply nozzle specially configured to create a non-uniform gas flow distribution. A greater volume or velocity of the gas flow is directed to desired portion of the patterning device.