Radiation-sensitive linear resin composition, pattern forming method, transparent insulating film, and display device

An object of the present invention is to provide a radiation-sensitive linear resin composition having excellent substrate adhesion and photolithographic characteristics, a pattern forming method using the radiation-sensitive linear resin composition, a transparent insulating film obtained through u...

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Bibliographische Detailangaben
Hauptverfasser:	SOMEYA, KAZUYA, HIKIDA, JIRO, SAIJYO, HIDEKI, OHUCHI, YASUHIDE, NODA, KUNIHIRO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	An object of the present invention is to provide a radiation-sensitive linear resin composition having excellent substrate adhesion and photolithographic characteristics, a pattern forming method using the radiation-sensitive linear resin composition, a transparent insulating film obtained through using the radiation-sensitive linear resin composition, and a display device having the transparent insulating film. The solution is that the present invention provides a radiation-sensitive linear resin composition that comprises monomer that comprises at least one element selected from a group consisting of La, Ce, Nd, Gd, Ho, Lu, Hf, and Ta, an oxide of the aforesaid elements, a chelating compound of the aforesaid elements, a salt of the aforesaid elements, and at least one filler, which is selected from a group consisting of alloys of the aforesaid elements and having an average particle diameter of 200nm or less, an alkali-soluble resin, a polyfunctional monomer, and a photopolymerization initiator. Preferably,