Approach of controlling the wafer and the thin film surface temperature
A vapor deposition system and its wafer and thin-film temperature control method are disclosed. A susceptor carries a plurality of satellite disks with each bearing a wafer. The susceptor makes revolution around a center axle and each satellite disk rotates around its own axis. A carrier gas approac...
Gespeichert in:
Hauptverfasser: | , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | A vapor deposition system and its wafer and thin-film temperature control method are disclosed. A susceptor carries a plurality of satellite disks with each bearing a wafer. The susceptor makes revolution around a center axle and each satellite disk rotates around its own axis. A carrier gas approaches a first surface of the wafer and is heated to form a thin film to be deposited on the first surface. A heating plate is placed at a second surface of the wafer and the second surface is opposite to the first surface. One or more remote temperature detectors measure a temperature of a surface of the heating plate and the surface is opposite to the wafer. And a wafer-side temperature is calculated by the measured temperature of the heating plate. |
---|