Refurbishing method of ruthenium or Ru alloy spent target and reused Ru or Ru alloy target having uniform grain size prepared thereby

The present disclosure provides a refurbishing method of a ruthenium (Ru)-based or ruthenium alloy-based sputtering spent target including: (a) washing or cut-processing the ruthenium-based or ruthenium alloy-based sputtering spent target; (b) placing the washed or cut-processed spent target into a...

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Bibliographische Detailangaben
Hauptverfasser: YANG, SEUNG-HO, YOON, WON-KYU, KWON, OH-JIB, HONG, GIL-SOO
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The present disclosure provides a refurbishing method of a ruthenium (Ru)-based or ruthenium alloy-based sputtering spent target including: (a) washing or cut-processing the ruthenium-based or ruthenium alloy-based sputtering spent target; (b) placing the washed or cut-processed spent target into a mold; (c) forming a laminated structure by filling the mold in which the spent target is placed with raw powder having the same components as the spent target, and flattening the mold; (d) forming a molded body by applying a pressure to the laminated structure; and (e) sintering the molded body, and also provides a ruthenium-based or ruthenium alloy-based sputtering target refurbished by the above-described method.