Object positioning system, control system, lithographic apparatus, object positioning method and device manufacturing method

The invention relates to an object positioning system comprising a movable object, an actuator system and a control system. The moveable object is moveable relative to a reference. The actuator system is configured to apply a force to the object at a force application location on the object in order...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	SIMONS, WILHELMUS FRANCISCUS JOHANNES, AANGENENT, WILHELMUS HENRICUS THEODORUS M, DIRKX, NIC JASPER, BUTLER, HANS, KAMIDI, RAMIDIN IZAIR
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The invention relates to an object positioning system comprising a movable object, an actuator system and a control system. The moveable object is moveable relative to a reference. The actuator system is configured to apply a force to the object at a force application location on the object in order to move the moveable object relative to the reference. The control system is configured to position a point of interest of the object relative to the reference. The control system is configured to drive the actuator system based on a parameter representing a spatial relationship between the force application location and the point of interest. The parameter is dependent on a further parameter representing a position of the object relative to the reference.