Laser patterning of dual sided transparent conductive films

A method of patterning an unpatterned transparent conductive film, the unpatterned transparent conductive film comprising: a transparent substrate, a first conductive layer disposed on a first surface of the transparent substrate, and a second conductive layer disposed on a second surface of the tra...

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Bibliographische Detailangaben
Hauptverfasser:	FRIED, ANDREW T, MONSON, ROBERT J, STEWARD, MICHAEL G, GRANSTROM, ERIC L, TREPTAU, JEFFREY P, VAKHSHOURI, KIARASH
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CABLES CALCULATING CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CLADDING OR PLATING BY SOLDERING OR WELDING COMPUTING CONDUCTORS COUNTING CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING ELECTRIC DIGITAL DATA PROCESSING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INSULATORS MACHINE TOOLS MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES METAL-WORKING NOT OTHERWISE PROVIDED FOR NANOTECHNOLOGY PERFORMING OPERATIONS PHYSICS PRINTED CIRCUITS SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES SEMICONDUCTOR DEVICES SOLDERING OR UNSOLDERING SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TRANSPORTING WELDING WORKING BY LASER BEAM
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Beschreibung
Zusammenfassung:	A method of patterning an unpatterned transparent conductive film, the unpatterned transparent conductive film comprising: a transparent substrate, a first conductive layer disposed on a first surface of the transparent substrate, and a second conductive layer disposed on a second surface of the transparent substrate, the first and second surfaces being disposed on two opposing sides of the unpatterned transparent conductive film, the first conductive layer comprising a first set of metal nanostructures, and the second conductive layer comprising a second set of metal nanostructures, the method comprising irradiating the first conductive layer with at least one first laser to form a patterned transparent conductive film, where the irradiation of the first conductive layer patterns the first conductive layer with a first pattern without also patterning the second conductive layer with the first pattern, and also where the unpatterned transparent conductive film and the patterned transparent conductive film bot