Radiation-sensitive resin composition, cured film, and its formation method, and the display device

Excellent radiation sensitivity and storage stability, chemical resistance, pattern adhesion after development, exposure pulling pattern adhesion after every, and radiation-sensitive resin composition of the cured film can be formed with excellent transparency, the radiation-sensitive resin cured fi...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	NARUKO, AKITO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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