Reduction of hotspots of dense features

A computer-implemented method to adjust line-width roughness (LWR) in a lithographic apparatus, the method including receiving a value of LWR and/or image log slope (ILS) for each feature of a plurality of different features of a pattern to be imaged, using a patterning device, onto a substrate in a lithographic process, and evaluating a cost function comprising a lithographic parameter and the values of LWR and/or ILS to determine a value of the lithographic parameter that (i) reduces a bias between the LWR and/or ILS of the different features, or (ii) reduces a difference in the LWR and/or ILS of the different features between different lithographic apparatuses, or (iii) reduces a difference in the LWR and/or ILS of the different features between different patterning devices, or (iv) any combination selected from (i)-(iii).