Photoresist compositions and methods of forming photolithographic patterns

Provided are photoresist compositions useful in forming photolithographic patterns by a negative tone development process. Also provided are methods of forming photolithographic patterns by a negative tone development process and substrates coated with the photoresist compositions. The photoresist c...

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Bibliographische Detailangaben
Hauptverfasser: LEE, CHRISTOPHER NAM, ANDES, CECILY, PARK, JONG-KEUN, WANG, DEYAN
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:Provided are photoresist compositions useful in forming photolithographic patterns by a negative tone development process. Also provided are methods of forming photolithographic patterns by a negative tone development process and substrates coated with the photoresist compositions. The photoresist compositions include one or more polymer additive that contains a basic moiety and which is substantially non-miscible with a resin component of the resist. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.