Gold or platinum target, and production method for same

The purpose of the present invention is to reduce the average crystal grain size of gold or platinum in a target in order to enhance the consistency of film deposition characteristics during sputtering, and to fabricate a target having uniform average crystal grain size in in-plane directions of the target surfaces and in the thickness direction of the target. This production method for a gold or platinum target has: an ingot fabrication step for casting molten gold or platinum to obtain an ingot; a primary forging step for forging the ingot in a first temperature range; a step for cooling the primary-forged ingot to a second temperature lower than the first temperature range; a secondary forging step for determining six directions, and further forging the cooled primary-forged ingot from the six directions in the second temperature range; a cross-rolling working step for adjusting the secondary-forged ingot to a third temperature range and carrying out cross-rolling working, producing a target shape; and a h