Cleaning method and cleaning device

The present invention relates to a cleaning method for spraying processing liquid to clean the object to be cleaned, which includes: a first step of spraying first processing liquid containing bubbles with relatively small size, such as micro-nanometer bubbles or nanometer bubbles, to the object to...

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Bibliographische Detailangaben
1. Verfasser: HIROSE, HARUMICHI
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The present invention relates to a cleaning method for spraying processing liquid to clean the object to be cleaned, which includes: a first step of spraying first processing liquid containing bubbles with relatively small size, such as micro-nanometer bubbles or nanometer bubbles, to the object to be cleaned; and, after the first step, a second step of spraying second processing liquid containing bubbles, such as micrometer bubbles, with a size larger than those contained in the first processing liquid to the object to be cleaned that is attached with the first processing liquid. After cleaning with the first processing liquid, because of using the second processing liquid containing bubbles with a size larger than those contained in the first processing liquid to proceed with cleaning, it is capable of using the ideal character of the first processing liquid with relatively small-sized bubbles for proceeding with cleaning and then using the ideal character of the second processing liquid with relatively lar