Beam delivery apparatus and method

A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form one or more branch radiation beams for provision to one o...

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Bibliographische Detailangaben
Hauptverfasser:	AMENT, LUCAS JOHANNES PETER, LOOPSTRA, ERIK ROELOF, NIKIPELOV, ANDREY ALEXANDROVICH, NIENHUYS, HAN-KWANG, KRUIZINGA, BORGERT, BANINE, VADIM YEVGENYEVICH, FRIJNS, OLAV WALDEMAR VLADIMIR, DE JAGER, PIETER WILLEM HERMAN, DONKER, RILPHO LUDOVICUS, RENKENS, MICHAEL JOZEF MATHIJS, VAN GORKOM, RAMON PASCAL, BARTRAIJ, PETRUS RUTGERUS, GRIMMINCK, LEONARDUS ADRIANUS GERARDUS, DE VRIES, GOSSE CHARLES, JANSSEN, FRANCISCUS JOHANNES JOSEPH, KATALENIC, ANDELKO, ENGELEN, WOUTER JOEP
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form one or more branch radiation beams for provision to one or more tools.