Photosensitive resin composition, method of forming resin pattern, and display device

The present invention provides a negative type photosensitive resin composition, a method of forming resin pattern and a display device. The photosensitive resin composition is capable of easily forming a resin pattern with a positive taper-shaped opening. The method of forming resin pattern is achi...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	SAIJYO, HIDEKI, KATANO, AKIRA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ADVERTISING APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY CRYPTOGRAPHY DISPLAY DISPLAYING EDUCATION ELECTROGRAPHY HOLOGRAPHY LABELS OR NAME-PLATES MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEALS SIGNS
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Beschreibung
Zusammenfassung:	The present invention provides a negative type photosensitive resin composition, a method of forming resin pattern and a display device. The photosensitive resin composition is capable of easily forming a resin pattern with a positive taper-shaped opening. The method of forming resin pattern is achieved by using the photosensitive resin composition. The display device has a resin pattern formed through the method of forming resin pattern. The photosensitive resin composition includes (A) an alkali-soluble resin, (B) a photopolymerization initiator and (C) a photopolymerization compound. The aforementioned (C) photopolymerization compound includes mono-functional monomers which has a glass transition temperature less than -10 degree C when making homopolymer with mass average molecular weight of 10000 or more.