Etching liquid for semiconductor substrate

The present invention relates to an alkaline etching liquid for processing the surface of a semiconductor substrate for a solar battery, the etching liquid including at least one item selected from the group comprising lignin sulphonic acid and salts thereof. Use of the etching liquid of the present...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: OHYAGI, NOBORU, KAMADA, YOSHITERU, YAMAMOTO, YUZO, SAIDA, TOSHINORI
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The present invention relates to an alkaline etching liquid for processing the surface of a semiconductor substrate for a solar battery, the etching liquid including at least one item selected from the group comprising lignin sulphonic acid and salts thereof. Use of the etching liquid of the present invention exhibits the effects of excellent productivity and of being able to form a texture in a short amount of time at relatively low temperatures. Further, the etching liquid produces the effects of the refinement and excellent surface elimination of the bubbles that are generated in large amounts during multi-sheet processing, and yield is increased because floating of a substrate during etching can be eliminated. In addition, textures having excellent surface quality can be formed because surface defects are reduced.