A semiconductor device, and a method of improving breakdown voltage of a semiconductor device
A semiconductor device having a first layer adjoining a semiconductor layer, and further comprising at least one field modification structure positioned such that, in use, a potential at the field modification structure causes an E-field vector at a region of an interface between the semiconductor a...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | A semiconductor device having a first layer adjoining a semiconductor layer, and further comprising at least one field modification structure positioned such that, in use, a potential at the field modification structure causes an E-field vector at a region of an interface between the semiconductor and the first layer to be modified. |
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