Method and system for improving wafer surface inspection sensitivity

Improvement of wafer surface inspection sensitivity includes acquiring a first inspection image from the surface of the wafer, generating a reference image by applying a thresholding function to the first image in order to isolate a speckle signal component of the first image induced by wafer surfac...

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Bibliographische Detailangaben
1. Verfasser:	PETTIBONE, DONALD
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CALCULATING COMPUTING COUNTING HANDLING RECORD CARRIERS INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS PRESENTATION OF DATA RECOGNITION OF DATA RECORD CARRIERS TESTING
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Beschreibung
Zusammenfassung:	Improvement of wafer surface inspection sensitivity includes acquiring a first inspection image from the surface of the wafer, generating a reference image by applying a thresholding function to the first image in order to isolate a speckle signal component of the first image induced by wafer surface roughness, acquiring one or more measurement inspection images from the surface of the wafer, and generating a difference image by subtracting the generated one or more reference images from the acquired one or more measurement inspection images.