Cleaning apparatus for silicon wafer

A cleaning apparatus for silicon wafers is described. The cleaning apparatus for the silicon wafers includes a first acid tank, an alkaline tank, a first cleaning tank, a first rinse device, a draining valve, a second cleaning tank, a second rinse device and a pump. The first cleaning tank is dispos...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	CHEN, HAOUNG, HSU, CHING-HSUN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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