Cleaning apparatus for silicon wafer
A cleaning apparatus for silicon wafers is described. The cleaning apparatus for the silicon wafers includes a first acid tank, an alkaline tank, a first cleaning tank, a first rinse device, a draining valve, a second cleaning tank, a second rinse device and a pump. The first cleaning tank is dispos...
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| Format: | Patent |
| Sprache: | chi ; eng |
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| Zusammenfassung: | A cleaning apparatus for silicon wafers is described. The cleaning apparatus for the silicon wafers includes a first acid tank, an alkaline tank, a first cleaning tank, a first rinse device, a draining valve, a second cleaning tank, a second rinse device and a pump. The first cleaning tank is disposed between the first acid tank and the alkaline tank. The first rinse device is disposed within the first cleaning tank. The first cleaning tank is suitable to receive a first cleaning liquid after cleaning by the first rinse device. The draining valve communicates with the first cleaning tank. The first cleaning liquid is drained out through the draining valve. The second cleaning tank is disposed between the first cleaning tank and the alkaline tank. The second rinse device is disposed within the second cleaning tank. The second cleaning tank is suitable to receive a second cleaning liquid after cleaning by the second rinse device. The pump is suitable to circulate the second cleaning liquid to the first cleaning |
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