Photo-sensitive resin composition for insulating film and cured article

An objective of this invention is to provide a photo-sensitive resin composition for insulating film which can achieve high sensitilization without increasing adding amount of photo-polymerizing initiator, and is excellent in analytical performance, reliability and chemical resistance, and suitable...

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Bibliographische Detailangaben
Hauptverfasser: TAKANO, MASAOMI, YAMADA, HIROAKI, NAMEKAWA, SHUHEI, HONMA, NAOTO, HAYASHI, SHUHEI
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:An objective of this invention is to provide a photo-sensitive resin composition for insulating film which can achieve high sensitilization without increasing adding amount of photo-polymerizing initiator, and is excellent in analytical performance, reliability and chemical resistance, and suitable for permanent insulating film. The present invention relates to a photo-sensitive resin composition for insulating film comprising, as necessary components, (i) an alkali-soluble resin represented by the following general formula (1) including a carboxyl group and a polymerizable unsaturated group per molecule, (ii) a photo-polymerizable monomer having at least one ethylenically unsaturated bond, (iii) a photo-polymerizing initiator, and (iv) an epoxy compound.